This volume provides an overview of advances in semiconductor studies using microscopy. It contains invited reviews and summary research papers from the 'Microscopy of Semiconducting Materials' conference held in Oxford in 1999. With IC technology continuing to advance, the analysis of very small structures remains critically important. The conference covers the use of transmission and scanning electron microscopy, ultrafine electron probes and EELS to investigate these structures, specimen preparation using focused ion beam milling and advances in microscopy techniques using different types of scanning probe (AFM, STM, SCM). It reports on studies of materials from finished devices to partly processed materials and structures including nanoscale wires and dots. It provides an authoritative reference for all academics and researchers in materials science, electrical and electronic engineering, instrumentation and condensed matter physics.